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根据阴极溅射和低压气体放电的一般理论,提出了用辉光放电光源作发射光谱分析时,能对电流强度进行校正的工作曲线的数学形式。并证明:在选择合适的放电条件下,经过校正,光源中的“基体效应”可以略去不计。在此基础上,以纯金属作标样,建立了用辉光放电光源对金属表面进行逐层定量分析的新技术。用它进行了钼钛合金上渗硼-硅钛-硅硼三元涂层的逐层定量分析,得到的数据与电子探针、X光衍射和金相结构观察的结果一致。该技术可测定平板状导体样品中深度为几到几十微米范围内的金属元素,层间分辨力约2—3微米。
According to the general theory of cathode sputtering and low pressure gas discharge, the mathematical form of working curve that can correct current intensity when using glow discharge light source for emission spectrum analysis is proposed. And prove: After choosing the appropriate discharge conditions, after correction, the “matrix effect” in the light source can be negligible. On this basis, using pure metal as a standard sample, a new technique of quantitatively analyzing metal surface by glow discharge light source was established. Using it, the layer-by-layer quantitative analysis of boronizing-silicon-titanium-boron-boron ternary coating on molybdenum-titanium alloy was carried out. The obtained data are consistent with the results of electron probe, X-ray diffraction and metallographic observation. The technology determines the depth of the flat conductor samples in the range of several to tens of microns of metal elements within the layer resolution of about 2-3 microns.