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利用直流反应磁控溅射技术，室温下在聚脂膜基片上制备了优良的ITO透明导电薄膜．研究了沉积速率，靶基距，氧流量以及厚度对薄膜光电性能的影响．所得薄膜的最低电阻率为4．23×10-4Ω·cm，可见光区平均透射率大于78％．对应于低电阻率（～10-4Ω·cm）和高透射率（～78＄）的反应窗口较文献中已报道的数据明显扩大．
Using DC reactive magnetron sputtering technique, an excellent ITO transparent conductive film was prepared on a polyester film substrate at room temperature. The effects of deposition rate, target distance, oxygen flow rate and thickness on the photoelectric properties of the films were investigated. The lowest resistivity of the resulting film was 4.23 × 10 -4 Ω · cm and the average transmittance in the visible region was greater than 78%. The reaction window corresponding to low resistivity (~10-4 Ω · cm) and high transmittance (~78%) is significantly larger than the reported data in the literature.