GaSb is the most suitable substrate in the epitaxial growth of mixed semiconductors of GaSb system.In this work,Te-doped GaSb bulk crystals with different doping concentration have been annealed at 550℃ for100 h in ambient antimony.The annealed samples have been studied by Hall effect measurement,infrared(IR)optical transmission,Glow discharge mass spectroscopy(GDMS) and photoluminescence(PL) spectroscopy.After annealing,Te-doped GaSb samples exhibit a decrease of carrier concentration and increase of mobility,along with an improvement of below gap IR transmission.Native acceptor related electrical compensation analysis suggests a formation of donor defect with deeper energy level.The mechanism of the variation of the defect and its influence on the material properties are discussed. GaSb is the most suitable substrate in the epitaxial growth of mixed semiconductors of GaSb system. In this work, Te-doped GaSb bulk crystals with different doping concentration have been annealed at 550 ° C for 100 h in ambient antimony. Annealed samples have been studied by Hall effect measurement, infrared (IR) optical transmission, Glow discharge mass spectroscopy (GDMS) and photoluminescence (PL) spectroscopy. After annealing, Te-doped GaSb samples exhibit a decrease of carrier concentration and increase of mobility, along with an improvement of below gap IR transmission. Native acceptor related electrical compensation analysis suggests a formation of donor defect with deeper energy level. The mechanism of the variation of the defect and its influence on the material properties are discussed.