日本三洋电器公司的研究人员研制出一种低温沉积陶瓷薄膜的离子束表面技术。这种界面控制气相沉积的工艺只适于基体与沉积薄膜之间的界面。 该复合工艺为:在10~(-9)真空度的真空室内,采用化学气相沉积的方法在基体表面沉积,形成一种界面层。由薄膜厚度敏感仪确定薄膜的厚度,当薄膜生长到规定的尺寸时,用离子枪产生一种界面薄 Researchers at Japan’s Sanyo Electric Co. have developed an ion beam surface technology for low temperature deposition of ceramic films. This interface-controlled vapor deposition process is only suitable for the interface between the substrate and the deposited film. The composite process is: in a vacuum chamber with a vacuum of 10-9, a chemical vapor deposition method is used to deposit on the surface of the substrate to form an interface layer. The film thickness is determined by the thickness of the film thickness, when the film grows to the specified size, with the ion gun to produce an interface thin