multi-exposur相关论文
分析了PIV采样底片多次曝光时粒子衍射调制作用对干涉条纹位置的影响,推导出条纹偏移量与曝光次数和粒子相对位移量的关系,分析结果得到......
A New Self-assembly Metal CMG Discriminator by Multi-exposure LiGA Like Process and Sacrificial Laye
The counter-meshing gears (CMG) discriminator is amechanically ceded lock, which is used to prevent the occurrenceof Hig......