Achromatic Talbot lithography (ATL) with high resolution has been demonstrated to be an excellent technique for large ar......

We present a novel homodyne frequency-shifting interference pattern locking system to enhance the exposure contrast of i......

Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve anal......

The strong absorption of materials in the extreme ultraviolet (EUV) above ~50 nm has precluded the development of effici......

Calcium fluoride is widely used in optical lithography lenses and causes retardation that cannot be ignored. However, fe......

The analysis of Y aperture element frequency selective surface (FSS) using the spectral domain method and the moment met......

A method for fabricating three-dimensional (3D) photonic crystals (PhCs) easily and simply, by using a visible light (~5......

Periodic nanostructures spaced by half of the wavelength can be obtained by the technology of laser-focused atomic depos......

In order to realize wideband filtering properties of frequency selective surface (FSS), FSS of closely packed elements i......

Wolter I collector is the best collector for extreme ultraviolet (EUV) lithography, which has a series of nested mirrors......

Scanning Dammann lithography (SDL) is proposed and implemented, which uses a Dammann grating to generate multiple beams ......

This work has demonstrated that with silver superlens, the resolution of conventional optical lithography can be improve......