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本室开展的气相沉积工作主要是真空气相沉积,也就是真空镀膜。这方面工作大致可分为两类:物理气相沉积(PVD)和化学气相沉积(CVD)。物理气相沉积是靠蒸发或溅射产生气相物质,并使其在工件上沉积形成薄膜。例如,目前制镜工业大量应用的“以铝代银”工艺,就是在玻璃板上蒸镀一薄层铝膜。溅射是利用气体放电时产生的正离子
Vapor deposition carried out in this room is mainly vacuum vapor deposition, that is, vacuum coating. There are two broad categories of work in this area: physical vapor deposition (PVD) and chemical vapor deposition (CVD). Physical vapor deposition is the production of vapor-phase material by evaporation or sputtering and deposition on a workpiece to form a thin film. For example, the large-scale application of “aluminum on behalf of silver” process in the mirror industry is to deposit a thin layer of aluminum film on a glass plate. Sputtering is the use of gas discharge generated when the positive ions