一、前言金属合金薄膜和界面层扩散的稳定性是关系到许多电子学装置预定寿命的一个重要因素。对于同样成分,但制备条件不同时测得的内扩散系数往往偏离较大,因此必须采用一种可靠的测量方法确定内扩散系数。X射线衍射分析技术特別适合于这类研究,因为它可以提供在一个小扩散区内成分与结构的信息,而且是无损的。 I. INTRODUCTION The stability of diffusion of metal alloy films and interfacial layers is an important factor that relates to the predetermined lifetime of many electronic devices. For the same composition, but the different conditions for the preparation of the measured internal diffusion coefficients tend to deviate from the larger, so you must use a reliable measurement method to determine the internal diffusion coefficient. X-ray diffraction analysis is particularly suitable for this type of research because it provides information on the composition and structure of a small diffusion zone and is non-destructive.