一、前言单片刻蚀机发展的必要性为满足VLSI对微细图形加工的需要,人们发展了多种干法刻蚀工艺。干法刻蚀工艺较之传统的湿法工艺有极大优越性。在生产上,它降低了化学成本,易于三废处理,减少了环境污染,有利于生产线的自动化;在工艺上,能得到高质量的细线条图形,具有高的方向性,好的选择性。由于这些优点,人们对干法刻蚀的研究表现出越来越大的兴 I. INTRODUCTION The Necessity of the Development of Monolithic Etch Machine To meet the needs of VLSI for the processing of fine patterns, a variety of dry etching processes have been developed. Dry etching process than the traditional wet process has great superiority. In production, it reduces chemical costs, easy waste disposal, reducing environmental pollution, is conducive to the automation of the production line; in the process, can get high-quality thin line graphics, with high directivity, good selectivity. Due to these advantages, people are showing more and more great interest in the research of dry etching