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采用热氧化方法,在泡沫铜上制备了高度有序的三维CuO纳米线(CuO NWs)阵列;利用扫描电镜(SEM),X射线衍射仪(XRD)和X射线光电子能谱(XPS)对CuO NWs阵列的形貌、成分以及结构等进行了表征。重点研究了不同氧化温度对CuO NWs形貌和氧化物平均晶粒尺寸的影响,讨论了纳米线的生长机制。结果表明:CuO NWs直径随温度升高而增大,密度随Cu2O平均晶粒尺寸增大而减小,CuO NWs的最佳生长温度为400℃,直径在50~120 nm,长度可达5μm,长径比最大,不易脱落。同时也研究了CuO NWs阵列光催化降解甲基橙的能力。结果表明:CuO NWs在可见光和紫外光照射下对甲基橙进行光催化降解时,其降解效率分别高达76.6%和87.2%。
Highly ordered arrays of CuO NWs were fabricated on the copper foam by thermal oxidation. CuO films were prepared by scanning electron microscopy (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy NWs array morphology, composition and structure were characterized. The effects of different oxidation temperatures on the morphologies of CuO NWs and the average grain size of the oxides were investigated. The growth mechanism of the nanowires was discussed. The results show that the diameter of CuO NWs increases with the increase of temperature and the density decreases with the increase of average grain size of Cu2O. The optimum growth temperature of CuO NWs is 400 ℃, the diameter of CuO NWs is 50-120 nm and the length of CuO NWs is up to 5 μm. The largest aspect ratio, not easy to fall off. The photocatalytic degradation of methyl orange by CuO NWs arrays was also studied. The results showed that the degradation efficiency of CuO NWs reached 76.6% and 87.2% respectively under the visible light and ultraviolet light irradiation.