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以多孔Al2O3陶瓷管为载体,采用化学镀法制备了钯膜。考察了化学镀温度及载体孔径对制备钯膜的影响,并利用扫描电镜对钯膜形貌结构进行了表征。研究表明,化学镀15min,钯沉积速率较快;反应时间延长至120min,钯沉积量增加,但是沉积速率降低。随着化学镀温度的升高,钯沉积量增加;但是温度过高,会导致钯利用率降低;温度为318K,化学镀钯膜较适宜。在孔径为0.2μm的Al2O3陶瓷管表面制备的钯膜平整、致密,其二次镀钯膜N2渗透速率为1.7×10-9mol/(m2·s·Pa)。
Porous Al2O3 ceramic tube as a carrier, the use of electroless plating palladium membrane was prepared. The effects of electroless plating temperature and support pore size on the palladium membrane were investigated. The morphology of palladium membrane was characterized by scanning electron microscopy. The results show that the deposition rate of palladium is faster in 15 min. When the reaction time is extended to 120 min, the deposition of palladium increases, but the deposition rate decreases. With the increase of electroless plating temperature, the amount of palladium deposition increases; however, the high temperature leads to the decrease of palladium utilization rate; the temperature is 318K, and the electroless palladium plating is more suitable. The palladium membrane prepared on the surface of Al2O3 ceramic tube with a pore size of 0.2μm was flat and dense, and the permeation rate of secondary palladium Pd was 1.7 × 10-9mol / (m2 · s · Pa).