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在制备薄膜的过程中,利用光谱分析的方法,以放电光谱特征谱线强度的变化来反映相应物质成分的变化,以连续光谱光源发出的光透射过薄膜的透射率的变化,来反映薄膜的厚度、折射率、吸收系数等光学参数的变化,从而达到在制膜过程中,对薄膜的成分、厚度等参数进行在线监控的目的.
In the process of preparing the thin film, using the method of spectral analysis, the variation of the spectral intensity of the discharge characteristic spectrum reflects the change of the composition of the corresponding substances, and the change of the transmittance of light transmitted through the film by the continuous spectral light source to reflect the change of the film Thickness, refractive index, absorption coefficient and other optical parameters changes, so as to achieve the film making process, the film composition, thickness and other parameters online monitoring purposes.