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采用磁过滤真空溅射离子沉积技术 ,用氩气和氮气共溅射石墨靶 ,在不同氮气分压下 ,制备了一组不同氮含量的四配位非晶碳薄膜 (ta C :N)。用X射线光电子能谱确定ta C :N薄膜中的氮含量 ;研究了氮含量对ta C薄膜的拉曼光谱和表面形貌的影响。结果表明 :不含氮的ta C薄膜的拉曼光谱是中心在 1580cm- 1、范围从 12 0 0cm- 1至 2 0 0 0cm- 1的类高斯峰 ,表面均匀光滑 ;含氮的ta C :N薄膜 ,其拉曼光谱分裂为 136 0cm- 1的D带和 1580cm- 1的G带 ,且D带与G带的最大强度比 ,以及薄膜的表面粗糙度随氮含量的增加而增大。最后讨论了氮含量对ta C薄膜的微结构的影响。
A series of tetrahedral amorphous carbon films with different nitrogen contents (ta C: N) were prepared under the different partial pressure of nitrogen using magnetic filtration vacuum sputtering ion deposition technique. The content of nitrogen in ta C: N thin film was determined by X-ray photoelectron spectroscopy. The effect of nitrogen content on Raman spectrum and surface morphology of ta C thin film was investigated. The results show that Raman spectra of nitrogen-free Ta C films are Gaussian peaks centered at 1580 cm -1, ranging from 1200 cm -1 to 20 000 cm -1. The surface is uniform and smooth. The nitrogen- N films with Raman spectra splitting into D band of 136 0cm-1 and G band of 1580cm-1, and the maximum intensity ratio of D band to G band, and the surface roughness of the films increased with the increase of nitrogen content. Finally, the effect of nitrogen content on the microstructure of ta C thin films was discussed.