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提出了一种新的曲率补偿法用于长焦距微透镜阵列的制作。扫描电子显微镜 ( SEM)显示微透镜阵列为表面极为平缓的方底拱形阵列 ,表面探针测试结果显示用曲率补偿法制作的微透镜的焦距可达到 3 861.70 μm,而常规光刻热熔法很难制作出焦距超过 2 0 0μm的相同尺寸的微透镜阵列。微透镜阵列器件与红外焦平面阵列器件在红外显微镜下对准胶合 ,显著改善了红外焦平面阵列器件的响应特性
A new curvature compensation method is proposed for the fabrication of long focal length microlens arrays. Scanning electron microscopy (SEM) shows that the microlens array is a square arched array with a very gentle surface. The surface probe test results show that the focal length of the microlens fabricated by the curvature compensation method can reach 3 861.70 μm, whereas the conventional photolithography It is difficult to fabricate microlens arrays of the same size with focal lengths in excess of 200 μm. The alignment of the microlens array device and the infrared focal plane array device under infrared microscopy significantly improves the response characteristics of the infrared focal plane array device