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本文从理论和工艺两个方面分析摄象靶疵点(白点和黑点)产生的原因,主要是透明电极粘附的颗粒引起光导层破坏和P—N结漏电或击穿。蒸发上去的颗粒引起P—N结破坏或阻挡电子束取走信号,蒸发造成P—N结附近深陷井能级密度太高,或电阻率太低而造成高工作靶压等。减少疵点的工艺途径是提高透明电极的质量、减少肉眼看不见的那些颗粒、改进蒸发料的处理方法、改善蒸发的控制水平、尽量减少蒸发带上去的颗粒,力求降低工作靶压。文中着重对白点进行了讨论。
In this paper, we analyze the causes of photogrammetric target defects (white spots and black spots) from two aspects of theory and technology. The main reason is that the particles adhered by the transparent electrode cause the destruction of the photoconductive layer and the leakage or breakdown of the P-N junction. Evaporation of the particles cause damage to the P-N junction or block the removal of the electron beam signal, resulting in evaporation of P-N junction deep trap near the energy density is too high, or resistivity is too low and cause high target pressure. Reduce defects in the process is to improve the quality of the transparent electrode to reduce those invisible particles, improve the evaporant processing methods to improve the evaporation control level, to minimize the particles on the evaporation zone, and strive to reduce the work target pressure. The article focuses on the discussion of white dots.