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按照国际标准ISO 11551研制了用于测量光学薄膜微弱吸收的激光量热装置。典型情况下吸收测量灵敏度优于10-6,测量误差估计为10%左右。在1064 nm波长测量1 mm厚石英玻璃基板的绝对吸收为3.4×10-6,测量灵敏度达到1.5×10-7。测量了不同膜层设计、不同使用角度、不同镀膜技术镀制的全介质高反膜样品;使用离子束溅射(IBS)技术镀制的Ta2O5/SiO2多层0°反射镜的吸收仅为1.08×10-5,而使用离子束辅助沉积(IAD)技术镀制的HfO2/SiO2多层45°反射镜的吸收测量值为6.83×10-5。
According to the international standard ISO 11551 has been developed for the measurement of optical thin film weak absorption laser calorimeter. Absorption measurement sensitivity is typically better than 10-6 and the measurement error is estimated to be around 10%. The absolute absorption of a 1-mm-thick quartz glass substrate at a wavelength of 1064 nm is 3.4 × 10 -6 and the measurement sensitivity is 1.5 × 10 -7. All samples of high dielectric constant film coated with different film design and coating angles were measured. The Ta 2 O 5 / SiO 2 multilayer 0 ° mirrors coated by ion beam sputtering (IBS) had an absorption of only 1.08 × 10-5, while the HfO2 / SiO2 multilayered 45 ° mirror plated with ion beam assisted deposition (IAD) technique has an absorption of 6.83 × 10-5.