用气相化学沉积法制备薄膜的过程,包括薄膜制备工艺本身和制备高纯度易挥发的原始材料(有机化合物,氢化物和卤化物)以及有关化学动力学和催化剂等理论问题的研究。对气相化学沉积法的巨大兴趣是用来制备光学参数较好的薄膜。一般情况下其性能大大优于用其他方法,如真空热蒸发、阴极或磁控溅射、离子辐射以及化学方法制备的薄膜。 The process of vapor-phase chemical deposition of thin films, including the thin-film preparation process itself and the preparation of high-purity volatile raw materials (organic compounds, hydrides and halides) as well as theoretical studies on chemical kinetics and catalysts. The great interest in vapor phase chemical deposition is used to make thin films with better optical parameters. Under normal circumstances its performance is much better than other methods, such as vacuum thermal evaporation, cathode or magnetron sputtering, ionizing radiation and chemical methods.