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本工作采用反应堆中子活化分析与化学腐蚀剥层相结合的方法,进行本征吸除硅片对重金属杂质吸除能力的研究。 用高温热处理法,将一定量的金引入本征吸除硅片内,制成引入金的测试样片。将样片置于反应堆内辐照,使杂质金活化。辐照通量为:2.6×10~(13)n/cm~2·s,辐照60小时,冷却3天。活化后的样片,用特制的聚四氟乙烯模具掩模,进行化学剥层处理,单次剥层厚度为10μm或20μm,剥层误差小于3％。蚀刻液用SCORPIO-3000多道分析器作~(198)Au的γ-谱分析。
In this work, a combination of reactor neutron activation analysis and chemical etching is used to study the ability of aspirating silicon to remove heavy metal impurity. With high-temperature heat treatment method, a certain amount of gold is introduced into the aspirating silicon wafer, made of gold into the test sample. Samples will be placed in the reactor irradiation, the activation of impurity gold. Irradiation flux was 2.6 × 10 ~ (13) n / cm ~ 2 · s, irradiated for 60 hours and cooled for 3 days. Activated samples, with a special teflon mold mask, chemical peel treatment, a single peel thickness of 10μm or 20μm, stripping error of less than 3%. The etching solution was analyzed by γ-ray spectroscopy of ~ (198) Au using a SCORPIO-3000 multi-channel analyzer.