用改进后的新法合成了两种新型的聚酯型光致抗蚀剂——聚5-苯基戊二烯叉丙二酸乙二酯和聚吠喃丙烯叉丙二酸乙二酯。合成方法简单,反应时间短(6～8小时)。用80瓦汞灯,距离8厘米,所需最短曝光时间分别为10秒和3秒,分辨率达到0.6微米。粘附性能好,抗蚀性强,加入染料后可用作氦氖激光全息照像记录介质。 Two new types of polyester-based photoresists, poly-5-phenyl-pentadiene and malonic-ethyl ester, were synthesized by the new method. The synthesis method is simple, the reaction time is short (6 to 8 hours). With a 80-watt mercury lamp at a distance of 8 cm, the minimum exposure times required are 10 seconds and 3 seconds with a resolution of 0.6 microns. Good adhesion, good corrosion resistance, can be used as a helium-neon laser holographic recording medium after adding dye.