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分析了采用CCD光电检测法对强反射复杂表面随机缺陷进行检测时的光学照明问题。给出了缺陷显现力的具体定义。对比了平行光和均匀散射光对消除强反射光的不同作用及对不同表面缺陷的显现力。分析了使用均匀散射光作为光源时 ,工件表面照度对成像质量的影响。给出了在上述条件下光照系统设计的基本原则。
The problem of optical illumination when using CCD photoelectric detection method to detect random defects of complex surfaces with strong reflection is analyzed. The specific definition of the flaw force is given. The different effects of collimated light and uniform diffused light on the elimination of strong reflected light were compared with those of different surface defects. The effect of illumination on the surface of the workpiece on the imaging quality is analyzed when using uniform scattered light as the light source. The basic principles of lighting system design under the above conditions are given.