离子注入工艺是一种表面掺杂处理工艺。它是将要掺杂的元素,首先电离成离子,然后在低能加速器中加速,再经质量分析器提纯和四极透镜聚焦,然后射到靶片材料上。靶片材料受离子轰击后,会引起表面性能的变化。一般注入原子半径小的元素如氮、碳、硼会在表面形成间隙化合物,都能改善材料的抗磨损性能。现在我国用的大部份拉丝模,材质为碳化钨加少量粘合剂Co(成份为WC+6％Co),氮、碳等元 Ion implantation is a surface doping process. It is the element to be doped, ionized first into ions, then accelerated in a low-energy accelerator, then refined by a mass spectrometer and focused by a quadrupole lens, and then shot onto the target material. The target material by ion bombardment, will cause changes in surface properties. General injection of small atomic radius elements such as nitrogen, carbon, boron will form a gap compounds on the surface, can improve the material’s wear resistance. Now most of our drawing dies are made of tungsten carbide with a small amount of binder Co (WC + 6% Co), nitrogen and carbon