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研究了真空直流磁控溅射下分别充 N2 、Ar气体对铬版成膜性能的影响 ,对两种膜层光密度、厚度、表面微结构形貌以及成分进行测试分析 ,膜层成分分析表明这两种气体仅充当了工作气体 ;综合研究结果表明 :在相同条件时 ,经两种气体作用的膜层其光密度出现很大差异的主要原因是由于气体的不同质量引起膜层沉积速率的不同 ,本文研究结果对制取预定光密度和良好蚀刻线条边缘的铬版具有非常重要的实用价值
The effects of N2 and Ar gas filling on the chrome film forming performance under vacuum DC magnetron sputtering were studied. The optical density, thickness, surface microstructure and composition of the two films were tested and analyzed. The film composition analysis showed The two gases only act as the working gas. The results of the comprehensive study show that the main reason for the great difference in optical density of the two kinds of gases under the same conditions is that the different deposition rates of the gases Different, the results of this study have very important practical value for the preparation of chrome plate with predetermined optical density and good etching line edge