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壳体金属化是等离子体电光开关实现阵列结构的必须 ,放电腔的绝缘是壳体金属化的技术关键和难点。分析了等离子体电极电光开关放电腔的主要放电过程和特性 ;介绍了几种厚度阳极化膜层的击穿电压和用于电光开关放电腔绝缘模拟实验的情况和结果。初步分析了影响阳极化膜用于等离子体电极电光开关放电腔绝缘的主要因素 ,实验表明 60 μm厚度的阳极化膜可以满足电光开关放电腔绝缘的实用要求。
The metalization of the shell is necessary for realizing the array structure by the electro-optical switch of the plasma. The insulation of the discharge cavity is the key and difficult technical of the metalization of the shell. The main discharge process and characteristics of the discharge chamber of the electro-optic switch were analyzed. The breakdown voltage and the simulation results of several kinds of anodic coatings were introduced. The main factors affecting the insulation of the discharge chamber of the electro-optic switch of the plasma electrode are analyzed preliminarily. Experiments show that the 60 μm-thick anodized film can meet the practical requirements of the insulation of the discharge chamber of the electro-optical switch.