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文章简述了国内外非晶硅太阳电池的发展及通常用于沉积含氢非晶硅（ａ－Ｓｉ：Ｈ）薄 膜的 ＰＣＶＤ工作原理。详尽叙述了 ＨＬＲＢ－ＴＤ６Ａ非晶硅太阳电池镀膜机的结构和 设计特点。该机设计合理，本底真空度高，电场、气流、温度分布均匀，无各室间不同 反应气体的交叉污染，沉积的Ｐ、Ｉ、Ｎ型ａ－Ｓｉ：Ｈ材料性能极佳，是在聚酯膜、不锈 钢带等柔性衬底上连续沉积ａ－Ｓｉ ：Ｈ太阳电池的理想设备。
The article briefly describes the development of amorphous silicon solar cells at home and abroad and the principle of PCVD, which is commonly used to deposit a-Si: H thin films. Described in detail HLRB-TD6A amorphous silicon solar coating machine structure and design features. The machine has reasonable design, high background vacuum, uniform electric field, air flow and temperature distribution without cross-contamination of different reactant gases in various chambers. The deposited P, I and N type a-Si: H materials are excellent in performance Polyester film, stainless steel strip and other flexible substrates deposited a-Si: H solar cells ideal for equipment.