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在６６０℃下以ＳｉＨ４－ＮＨ３－ＣＯ２作为反应气体利用常压ＣＶＤ（ＡＰＣＶＤ）设备沉积得到了氧氮玻璃薄膜．此温度比文献报道的ＡＰＣＶＤ法低２００℃以上，有效地降低了沉积温度．实验发现ＮＨ３中水汽对沉积反应的显著影响．初步研究表明：运用ＡＰＣＶＤ法将这种薄膜应用于普通钠钙硅玻璃的表面改性，可使镀膜玻璃的表面硬度比退火玻璃提高了５０％以上
An oxynitride glass film was deposited by atmospheric pressure CVD (APCVD) using SiH4-NH3-CO2 as a reaction gas at 660 ° C. This temperature is lower than the APCVD reported in the literature above 200 ℃, effectively reducing the deposition temperature. The experiment found that the water vapor in NH3 had a significant effect on the deposition. Preliminary studies have shown that: APCVD method using this film for ordinary soda-lime silica glass surface modification, the coated glass surface hardness than annealed glass increased by 50% or more