在Ar和O2气氛下采用直流反应溅射制备了NiOx薄膜,利用X射线衍射(XRD)和X射线光电子能谱技术(XPS)对薄膜的晶体结构、Ni离子在不同化学态的结合能进行了表征。NiOx薄膜的扫描电子显微镜(SEM)照片表明薄膜有较好的晶体结构,晶粒尺寸为10 nm左右。NiOx薄膜中Ni元素是Ni2+和Ni3+混合价态,薄膜颜色为淡棕色,NiOx表现出阳极电致变色特征,其电致变色的行为是由于Li+和OH-在NiOx薄膜中的注入和拉出引起的Ni2+和Ni3+发生转化所致。通过电致变色动态测试对样品的电致变色性能和相应的响应时间进行了研究,讨论了沉积气压与NiOx薄膜的电致变色性能之间的关系。当沉积气压为3 Pa时,所制备的NiOx薄膜样品具有较好的电致变色性能,其在可见光范围的平均调色范围为47%,着色时间为9 s,漂白时间为1 s,具有较快的响应时间。 NiOx thin films were prepared by direct current reactive sputtering in Ar and O2 atmospheres. The crystal structure and the binding energies of Ni ions in different chemical states were characterized by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) Characterization. Scanning electron microscopy (SEM) images of the NiOx thin film show that the film has a good crystal structure with a grain size of about 10 nm. NiOx film is Ni2 + and Ni3 + mixed valence state, the film color is light brown, NiOx shows the electrochromic characteristics of the anode, and its electrochromic behavior is caused by the injection and pull-out of Li + and OH- in the NiOx film Ni2 + and Ni3 + due to conversion. The electrochromic properties and the corresponding response time of the samples were studied by electrochromic dynamic test, and the relationship between the deposition pressure and the electrochromic properties of NiOx films was discussed. When the deposition pressure is 3 Pa, the prepared NiOx thin film samples have good electrochromic properties, the average tinting range in the visible range is 47%, the tinting time is 9 s, the bleaching time is 1 s, Fast response time.