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我们提出了一种用于液晶盒的新取向工艺,可以得到0或非0的预倾角。这项工艺是用定向的等离子体流倾斜辐照基板。我们用一个阳极层发射器(anodelagerthruster)作为等离子体辐射源,以产生层状的等离子体流。它适合于处理大面积基板,可以处理有机(聚合物)和无机(玻璃,ITO)层。等离子体流辐照可以得到两种类型的液晶取向:(1)最可及(择优)取向轴位于离子束方向和基板法线组成的入射平面上;(2)最可及取向轴垂直于入射面。随着照射总剂量的增加,取向方向可以从类型(1)向类型(2)转变。在第一种取向模式中,可以通过改变工艺参数,如入射角、离子流密度和离子能等来改变预倾角。第二种取向模式的特征是预倾角为0。第一种模式的方位锚泊能系数相对较弱(W=10-3 Erg/cm2),而第二种类型锚泊能很强(W>10-1 Erg/cm2),与摩擦聚合物基板相当。两种模式的取向特征可以用来产生满足所需参数的取向,和构图(pattern)液晶盒基板。这种工艺方法可以克服传统摩擦工艺的某些缺点。
We propose a new orientation process for a liquid crystal cell that can give 0 or non-zero pretilt. The process is to irradiate the substrate obliquely with a directed plasma flow. We use an anode launcher (emitter) as a plasma emitter to create a laminar plasma flow. It is suitable for handling large area substrates that can handle organic (polymer) and inorganic (glass, ITO) layers. There are two types of liquid crystal orientations that can be obtained by the plasma beam irradiation: (1) the most accessible (preferred) orientation axis lies in the plane of incidence of the ion beam direction and the normal to the substrate; (2) the most accessible and oriented axis is perpendicular to the incident surface. As the total dose of radiation increases, the orientation direction can shift from type (1) to type (2). In the first orientation mode, the pretilt angle can be changed by changing process parameters such as incident angle, ion current density, and ion energy. The second orientation mode is characterized by a pretilt angle of zero. The first mode has a relatively weaker anchoring coefficient (W = 10-3 Erg / cm2) and the second type (W> 10-1 Erg / cm2), comparable to a rubbed polymer substrate. The orientation characteristics of the two modes can be used to create the orientation that satisfies the required parameters and pattern the cell substrate. This process method can overcome some of the disadvantages of traditional friction processes.