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研究了电子贮存环中由于同步辐射产生的动态出气。其主要形式是氢和一氧化碳.原位烘烤不能减少动态气体脱附。其原因是烘烤仅清洁真空容器表面,而不能清除表面与基体之间被污染的边界层。
The dynamic exit of the electron storage ring due to synchrotron radiation was studied. Its main form is hydrogen and carbon monoxide. In-situ bake does not reduce dynamic gas desorption. The reason is that baking only cleans the surface of the vacuum container, but does not remove the contaminated boundary layer between the surface and the substrate.