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应用材料(Applied Materials)公司日前宣布一项突破性技术,可借由全新的Applied Producer Onyx薄膜处理系统,降低半导体晶片的耗电量。低k值薄膜用于隔绝晶片中长达数里的导线,Producer Onyx系统可最佳化此薄膜的分子结构,协助客户在进入22纳米及以下技术时,可持续致力于推动生产更快速且更具能源效率的逻辑装置。应用材料公司绝缘系统及模组事业部门副总裁暨总经理Bill McClintock表示:“导线的耗电量约占晶片整体耗电量的三分之一,降低这个部分的耗电量,是提升先进逻辑装置的效能并延长电池使用时间的关键。透过应用材料公
Applied Materials Inc. announced a breakthrough technology that will reduce the power consumption of semiconductor wafers with the new Applied Producer Onyx Thin Film Processing System. Low-k films are used to isolate wires up to several miles in the wafer. The Producer Onyx system optimizes the molecular structure of the film, enabling customers to continue their dedication to faster and more productive production at 22 nm and below Energy-efficient logic device. Bill McClintock, vice president and general manager of Applied Materials Insulation Systems and Modules Division, said: ”The power consumption of the wire is about one-third of the overall power consumption of the chip, reducing the power consumption of this part is to enhance the advanced The key to the effectiveness of logic devices and extending battery life is through the use of materials