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将粒子成像测速(PIV)技术应用于旋转盘反应器,获得了旋转盘表面流场的瞬时速度分布,研究了操作参数(流量和转速)对流场速度分布的影响.结果表明,从盘中心到边缘瞬时速度先减小后增大;转盘中心区域的速度场主要由流量控制,流体的相对径向速度随流量增大而增大;转盘外缘区域的速度场主要由转速控制,流体的相对周向速度随转速增大而增大;实验条件下临界半径Rc=50 mm,转盘设计半径应适当大于临界半径.
The particle velocity imaging (PIV) technique was applied to the rotating disk reactor to obtain the instantaneous velocity distribution of the flow field on the rotating disk surface. The influence of the operating parameters (flow rate and rotational speed) on the flow velocity distribution was studied. The velocity of the turntable in the central region is mainly controlled by the flow rate and the relative radial velocity of the turntable increases with the increase of the flow rate. The velocity field in the outer rim region of the turntable is mainly controlled by the speed and the velocity The relative circumferential velocity increases with the increase of rotating speed. Under the experimental conditions, the critical radius Rc = 50 mm, the design radius of turntable should be larger than the critical radius.