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阐述利用离子注入、离子束增强沉积、反应离子束溅射及反应离子束辅助沉积等方法制备碳化硅薄膜的实验结果，并报道利用等离子体增强化学气相沉积技术制备可光致发光的非晶态α－ＳｉＣ：Ｈ薄膜的工作。
The experimental results on the preparation of silicon carbide thin films by ion implantation, ion beam enhanced deposition, reactive ion beam sputtering and reactive ion beam assisted deposition are reported. The photoluminescence of amorphous state is reported by using plasma enhanced chemical vapor deposition α-SiC: H thin film work.