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测量在空气和真空中３０８ｎｍ准分子激光对Ｃ６０薄膜的刻蚀速率和刻蚀阈值，讨论了环境中氧气对刻蚀特性的影响。
The etching rate and etching threshold of C60 thin film by 308nm excimer laser in air and vacuum were measured and the influence of oxygen in the environment on the etching characteristics was discussed.