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采用射频等离子体增强化学气相沉积与非平衡磁控溅射复合技术制备了MoSx掺杂的DLC薄膜(a-C:H:Mo:S),在QG-700摩擦试验机上考察了其在不同载荷下的摩擦磨损行为.通过对摩擦表面的扫描电镜(SEM)观察及能谱(EDS)分析,简单探讨了其摩擦磨损机理.结果表明:随着载荷的增加,a-C:H:Mo:S/Si3N4体系的摩擦系数及磨损率均呈先降后升的趋势,在高速下尤为明显.初步分析认为该现象与摩擦热效应导致的接触层结构转化相关.
MoSx-doped DLC films (aC: H: Mo: S) were prepared by radio frequency plasma enhanced chemical vapor deposition and unbalanced magnetron sputtering. Their QDs were measured on a QG-700 friction tester at different loads Friction and wear behavior of the aC: H: Mo: S / Si3N4 system was investigated by scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) The coefficient of friction and the wear rate all show the trend of decreasing firstly and then increasing, especially under the high speed.The preliminary analysis shows that this phenomenon is related to the transformation of the contact layer structure caused by the frictional thermal effect.