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介绍 Ｈ Ｌ－ １ Ｍ 托卡马克装置的壁处理技术。使用氦辉光放电清洗清除装置杂质和降低壁中氢含量，壁硼化和硅化技术以及原位沉积膜的原位清除。
Describe the wall treatment technology for the H L-1 M tokamak device. Helium glow discharge was used to clean the device impurities and reduce hydrogen content in the walls, wall boriding and silicidation techniques, and in situ clean-up of in-situ deposited films.