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研究了以乙硼烷(B_2H_6)作硼扩散源的情况。在950℃至1200℃温度下氧化和还原时,所用的气体浓度为1.5至700ppm。氧化条件下获得的重复性和均匀性十分良好。并认为B_2H_6氧化时形成的水对分布在炉管中的硼掺杂片有重要的影响。在还原条件下所得的结果是不甚满意的,但还原条件可以应
The case of using diborane (B 2 H 6) as the diffusion source of boron was studied. When oxidizing and reducing at a temperature of 950 ° C to 1200 ° C, the gas concentration used is 1.5 to 700 ppm. Repeatability and uniformity obtained under oxidizing conditions is very good. It is considered that the water formed during the oxidation of B_2H_6 has an important effect on the boron-doped sheet distributed in the tube. The results obtained under reducing conditions are not satisfactory, but the reduction conditions should be