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反应溅射存在不稳定性,需要对反应溅射过程进行非线性控制。分析了迟滞效应的不稳定特性,提出了基于PEM的非线性动态平衡控制法。以镀CrN膜为研究对象,靶原子光谱相对强度为反馈参数,用ATmega16设计了反应气体的PEM控制系统,分析了压电阀的控制特性。以PI和模糊PI为非线性控制方法,按照镀膜工艺要求在四靶磁控溅射镀膜机上进行控制试验。结果表明,压电阀非线性特性严重,需作为系统反馈参数;模糊PI方法较PI方法优,能实现反应溅射过程的动态实时稳定,控制误差为±2.5%。基片的镀膜厚度和耐磨性满足使用要求,验证了模糊PI法在反应溅射控制工程应用的正确性,为发展高性能的硬质薄膜材料奠定了基础。
Reaction sputtering instability, the need for reactive sputtering process of nonlinear control. The instability characteristics of hysteresis are analyzed, and a nonlinear dynamic balance control method based on PEM is proposed. Taking the CrN film as the research object and the relative intensity of the target atom as the feedback parameter, the PEM control system of reaction gas was designed by ATmega16, and the control characteristics of the piezoelectric valve were analyzed. With PI and fuzzy PI as a nonlinear control method, according to the coating process requirements in four target magnetron sputtering coating machine control test. The results show that the nonlinearity of the piezoelectric valve is serious and needs to be taken as the system feedback parameter. The fuzzy PI method is better than the PI method and can realize the dynamic real-time stability of the reactive sputtering process with the control error of ± 2.5%. Substrate coating thickness and wear resistance to meet the requirements to verify the fuzzy PI method in the reactive sputtering control engineering application of the correctness for the development of high performance hard film material laid the foundation.