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采用磁控溅射的方法制作Mo-SiO_2太阳能选择性吸收涂层,测量了涂层经过空气高温退火前后在0.34～25μm波长范围内反射曲线的变化情况。刚沉积完的涂层,太阳吸收比达到0.95,发射比为0.093。在空气中500、600℃退火1h后,涂层反射曲线基本不变。在空气中700℃退火1h后,涂层光谱选择性恶化,太阳吸收比下降到0.91,发射比上升到0.6。通过扫描电子显微镜观察了单层Mo、单层SiO_2以及SiO_2覆盖Mo的样片薄膜在空气中不同温度退火前后的形貌变化,发现以上薄膜表面不再平整,甚至出现裂纹和薄膜脱落,成为Mo-SiO_2选择性吸收特性恶化的主要原因。
The selective absorption coating of Mo-SiO_2 solar energy was fabricated by magnetron sputtering method. The change of the reflection curve of the coating in the wavelength range of 0.34 ~ 25μm was measured before and after the coating was annealed at high temperature. Just finished deposition of the coating, the sun absorption ratio of 0.95, the emission ratio of 0.093. After annealing in air at 500,600 ℃ for 1h, the reflection curve of the coating is almost unchanged. After annealing in air at 700 ℃ for 1h, the selectivity of the coating deteriorated. The solar absorptance decreased to 0.91 and the emission ratio increased to 0.6. Morphology changes of single-layer Mo, single-layer SiO_2 and SiO_2-covered Mo films at different temperatures in air were observed by scanning electron microscopy. It was found that the surface of the above film was no longer flat and even cracks and thin films were formed, The main reason for the deterioration of selective absorption characteristics of SiO 2.