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利用XRD、EDS和SEM分析研究了磁控溅射和电弧离子镀2种工艺制备的Al涂层的微观结构、形貌和抗氧化性能。磁控溅射技术制备的均匀、致密的Al层拥有更为细小的晶粒组织。在氧化实验后,磁控溅射制备的Al涂层形成了一个由表层氧化层、次表层富Al层和互扩散层的保护性结构。相比之下,电弧离子镀制备的Al涂层表现出了更差的抗氧化性。这是由于在离子镀制备的Al涂层中发现的针孔可以为氧气的侵入提供通道,从而引起涂层的内氧化并最终导致涂层的剥离。结果表明,磁控溅射制备Al涂层具备更好的抗高温氧化性能。
The microstructure, morphology and oxidation resistance of Al coatings prepared by magnetron sputtering and arc ion plating were investigated by XRD, EDS and SEM. Magnetron sputtering technology to prepare a uniform, dense Al layer with more fine grain structure. After the oxidation experiment, the Al coating prepared by magnetron sputtering formed a protective structure consisting of the surface oxide layer, subsurface Al-rich layer and interdiffusion layer. In contrast, Al-coatings prepared by arc ion plating exhibit poorer oxidation resistance. This is because the pinholes found in the Al coating prepared by ion plating can provide a channel for the intrusion of oxygen to cause internal oxidation of the coating and eventually lead to peeling of the coating. The results show that the magnetron sputtering Al coating has better high temperature oxidation resistance.