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采用多靶射频磁控溅射方法,在Si(100)衬底上制备不同调制周期(Λ分别为54 nm、30 nm、18 nm)MoS_2/类金刚石(DLC)多层薄膜.利用扫描电子显微镜、拉曼光谱仪、X射线衍射仪、透射电子显微镜、纳米压痕仪研究多层膜的形貌、微观结构及力学性能受调制周期的影响规律;利用球-盘摩擦试验机考察薄膜在大气环境下的润滑性能.结果表明:采用交替沉积MoS_2/DLC多层膜可有效抑制溅射MoS_2中柱状结构生长,制备的薄膜结构致密;多层膜硬度随调制周期的增加而增大.透射断面分析表明:多层膜层间界面不平整但周期性结构清晰且致密,其调制周期厚度与试验设定值基本一致.与纯MoS_2薄膜相比,调制周期为54 nm的薄膜具有较好的法向承载及弹性恢复能力,其硬度最高,达7.15 GPa;法向载荷为5 N时,该薄膜在大气环境(相对湿度约30%)下具有最低的摩擦系数(0.09)和最低的磨损率[1.34×10~(–7) mm~3/(N·m)].
Multi-target RF magnetron sputtering was used to fabricate MoS_2 / DLC multilayers with different modulation periods (Λ = 54 nm, 30 nm, 18 nm, respectively) on Si (100) substrates.Using scanning electron microscopy , Raman spectroscopy, X-ray diffraction, transmission electron microscopy, nanoindentation instrument multilayer morphology, microstructure and mechanical properties by the modulation cycle of the law; the use of ball-disk friction test machine to investigate the film in the atmosphere The results show that the alternating deposition of MoS_2 / DLC multilayers can effectively suppress the growth of columnar structure in the sputtered MoS_2, the structure of the deposited films is compact and the hardness of multilayers increases with the increase of the modulation period.The results of transmission cross section analysis The results show that the interface between multilayer films is not flat but the periodic structure is clear and compact, and the thickness of the modulation period is basically the same as the experimental set value.Compared with the pure MoS_2 film, the film with the modulation period of 54 nm has better normality Bearing and resilient resilience with the highest hardness of 7.15 GPa and the lowest coefficient of friction (0.09) and the lowest rate of wear at atmospheric (RH = 30%) normal load of 5 N [1.34 × 10 ~ (-7) mm ~ 3 / (N · m)].