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用磁控溅射法在Ａｒ＋Ｎ２混合气氛中制备了性能优异的具有纳米结构的Ｆｅ－Ｔａ－Ｎ软磁薄膜。氮原子以间隙原子的形式进入纳米形态的α－Ｆｅ的晶格中，并引起了相应的晶格形变。随氮分压（ｐＮ２）的提高，α－Ｆｅ晶粒的尺寸迅速减小，在交换耦合作用下，表现出优异的软磁性能，氮分压较高时（ｐＮ２７％），Ｔａ原子和Ｎ原子将形成Ｔａ３Ｎ５化合物相，导致薄膜软磁性能的相应降低。
Fe-Ta-N soft magnetic films with nanostructures were prepared by magnetron sputtering in Ar + N2 mixed atmosphere. The nitrogen atoms enter the lattice of α-Fe nanostructures in the form of interstitial atoms and cause the corresponding lattice deformation. With the increase of nitrogen partial pressure (pN2), the size of α-Fe grains decreases rapidly and exhibits excellent soft magnetic properties under exchange coupling. When the partial pressure of nitrogen is high (pN2 7%), Ta atoms And N atoms will form Ta3N5 compound phase, resulting in a corresponding reduction of soft magnetic properties of the film.