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本文利用二氧化硅薄膜的光学干涉效应和可变角度反射测量装置,给出了一种同时测定薄膜折射率和厚度的新方法.薄膜折射率和厚度的测量误差分别小于5%和6%.
In this paper, a new method for the simultaneous determination of the refractive index and the thickness of a thin film is given using the optical interference effect of the silica film and the variable angle reflection measuring device. The measurement errors of the refractive index and the thickness of the thin film are respectively less than 5% and 6%.