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通过微波等离子化学气相沉积法（ＭＰＣＶＤ）在镜面抛光Ｓｉ（１００）上生长出高品质的具有（１００）织构的金刚石薄膜．列举了最佳成核与生长条件．ＳＥＭ和Ｒａｍａｎ光谱对所得样品进行了表征，并对偏压的影响及成核生长机制进行了讨论．
High quality diamond films with (100) texture were grown on mirror polished Si (100) by microwave plasma chemical vapor deposition (MPCVD). The best conditions for nucleation and growth are listed. The obtained samples were characterized by SEM and Raman spectroscopy, and the influence of bias voltage and the mechanism of nucleation and growth were discussed.