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介绍了用灵敏的溶出伏安法定量测定铑。铑与氯离子的配合物被吸附在吊挂的滴汞电极上,当负向扫描时,测得聚集配合物的还原电流。用循环伏安法来表征介面特征和氧化还原特性。论述了PH、氯化物浓度、累积电位和其它变量的影响。累积 5 min的检测限为 1×10~(-8)M(～1.ng/ml)。在7×10~(-7)M以内,观测到线性的电流-浓度关系,相对标准偏差(在2×10~(-7)M含量时)为3.0％。研究了共存金属的可能干扰。
The quantitative determination of rhodium by sensitive stripping voltammetry is described. The complex of rhodium and chloride ion was adsorbed on the suspended drop mercury electrode, and the reduction current of the aggregated complex was measured when scanning negatively. Cyclic voltammetry was used to characterize interface features and redox properties. The effects of pH, chloride concentration, cumulative potential and other variables are discussed. The detection limit of cumulative 5 min was 1 × 10 ~ (-8) M (~ 1.ng / ml). Within 7 × 10 -7 M, a linear current-concentration relationship was observed with a relative standard deviation (at 2 × 10 -7 M) of 3.0%. The possible interference of coexisting metals was investigated.