四、高真空电弧放电型离子镀高真空电弧放电型离子镀是在ARE法的基础上发展起来的。它如图13那样在E型枪蒸发源附近装备了电离电极和热电子发射电极。当电子束使蒸发材料蒸发后,由于电离电极的存在,在蒸发材料本身的蒸汽压及高温蒸发源发射的热电子作用下,产生弧光放电。因为它不需使用任何放电气体(如常用的氩),所以这种放电可以在高真空下实现。同时当蒸发材料迁移时,在靠近蒸发源处便即电离,所以蒸发材料的离子化率非常 Fourth, high vacuum arc discharge type ion plating High vacuum arc discharge type ion plating is based on the ARE law developed. It is equipped with ionization and thermionic emission electrodes near the E-gun evaporation source as shown in Fig. When the electron beam evaporates the evaporation material, an arc discharge occurs due to the presence of the ionization electrode, the vapor pressure of the evaporation material itself, and the hot electrons emitted by the high-temperature evaporation source. Because it does not require the use of any discharge gas (such as argon), this discharge can be achieved under high vacuum. At the same time, when the evaporation material is migrated, it is ionized near the evaporation source, so the ionization rate of the evaporation material is very high