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用直流(d.c)反应磁控溅射沉积技术、X射线衍射(XRD)和透射电子显微镜成像(TEM)微结构分析方法,研究了氮化钛薄膜表面层固态结构随凝聚增原子能量的变化情况.发现沿(111)和(002)晶面方向择优生长的TiNx层的点阵参数(a0)与衍射峰半高宽(FWHM)的变化和载能束引起薄膜微观相成分、晶面内压应力、晶粒尺寸和结构缺陷密度紧密相关.在新的理论框架下,分别计算了氮化钛薄膜表面上每个凝聚原子的有效迁移,薄膜表面达到最小能量状态时每个凝聚原子应该获得的平均能.实验观察的结果在理论分析中得到了定量解释.
The changes of the solid state structure of the surface layer of titanium nitride film with the energy of condensed atoms were studied by DC magnetron sputtering deposition, X-ray diffraction (XRD) and transmission electron microscopy (TEM) It was found that the lattice parameters (a0) and full width at half maximum (FWHM) of the TiNx layer grown preferentially along the (111) and (002) Stress, grain size and structure defect density.According to the new theoretical framework, the effective migration of each condensed atom on the surface of TiN thin film is calculated respectively, and each condensed atom should be obtained when the film surface reaches the minimum energy state The average energy of the experimental observations in the theoretical analysis has been quantitatively explained.