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本文阐述了在中国原子能科学研究院“天光一号”ＫｒＦ激光核聚变实验装置上，ＭＯＰＡ系统光学元件加工与镀膜研究工作的进展。实验测量结果表明，加工后的基片表面均方根粗糙度对于Ｋ９光学玻璃与熔融石英玻璃来说分别为σｒｍｓ＝１．８±０．５ｎｍ，σｒｍｓ＝２．０±０．４ｎｍ。镀ＨｆＯ２／ＳｉＯ２高反射膜的光学元件的反射率与破坏阈值分别为Ｒ＞９９．５％，Ｅｔｈ＝１．３０～１．３３Ｊ／ｃｍ２。镀Ａｌ２Ｏ３／ＭｇＦ２增透膜的光学元件的透射率与破坏阈值分别为Ｔ＞９９．５％，Ｅｔｈ＝１．３～１．９７Ｊ／ｃｍ２。
This article describes the progress of research and fabrication of optical components in MOPA system at KrF Laser Fusion Experimental Unit of China Institute of Atomic Energy. The experimental results show that the root mean square roughness of the machined substrate surface is σrms = 1.8 ± 0.5nm and σrms = 2.0 ± 0.4nm for K9 optical glass and fused silica glass, respectively. Reflectance and failure threshold of the optical elements coated with HfO2 / SiO2 high reflection film are respectively R> 99.5% and Eth = 1.30-1.33 J / cm2. The transmittance and failure threshold of optical elements coated with Al2O3 / MgF2 AR coatings were T> 99.5% and Eth = 1.3-1.97 J / cm2, respectively.