【摘 要】
：
用离子束溅工艺在K9玻璃基片上沉积Ti薄膜,并用原子力显微镜对其表面形貌进行测量,通过数值相关运算,发现在此工艺条件下薄膜生长界面为各向同性的自仿射分形表面,并用粗糙指
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用离子束溅工艺在K9玻璃基片上沉积Ti薄膜,并用原子力显微镜对其表面形貌进行测量,通过数值相关运算,发现在此工艺条件下薄膜生长界面为各向同性的自仿射分形表面,并用粗糙指数、横向相关长度和标准偏差粗糙度对薄膜样品表面进行定量描述.利用自仿射分形表面的相关函数对数值运算的结果进行拟合,得出Ti薄膜生长界面的粗糙度指数α=0.72,相应的分形维数Df=2.28,并由此得到在离子束溅射工艺下Ti薄膜属于守恒生长的结论,其生长动力学过程可用Kuramoto-Sivashinsky方程来描述.
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