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研究了用离子镀方法沉积 TiN 膜作为高温环境下耐热涂层和基体之间扩散壁障(中间阻挡层)的可行性。结果表明,有 TiN 中间层试样。其高温抗氧化性能明显提高,TiN 层在一定温度范围内有良好的稳定性和阻扩散性。阐述了以Al 为耐热涂层时,TiN 中间层阻挡 Al 原子扩散的机理。
The feasibility of depositing a TiN film by ion plating as a diffusion barrier (intermediate barrier) between a heat-resistant coating and a substrate at a high temperature was investigated. The results show that there is TiN interlayer sample. Its high temperature oxidation resistance significantly improved, TiN layer in a certain temperature range has good stability and resistance diffusion. The mechanism of blocking the diffusion of Al atoms by TiN interlayer is described when Al is a heat-resistant coating.