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研究了用电化学方法在 Sn O2 基底上沉积的 Ni Ox Hy 膜电致变色特性 ,该膜是一种富氧结构 ,具有优良的变色特性 ,其透射式光密度ΔOD在可见光区可达 1以上 .Ni Ox Hy 膜在 KOH电解液中的电致变色行为是由质子的注入或萃取所决定 .H+注入并占据 Ni空位 ,会使一部分 Ni3+转化为 Ni2 + ,Ni3+的减少将导致光透性增强 ,这是因为Ni的 d电子能级在 Ni O6 八面体晶场中被分裂为 t2 g和 eg 能级 .H+的注入使 Ni3+的 t2 g能级被电子填满 ,变为 Ni2 + ,导致光学透明 .反之 ,H+ 的萃取使 t2 g能级出现空穴 ,即形成 Ni3+ ,导致光吸收
The electrochromic property of Ni Ox Hy film deposited on Sn O2 substrate by electrochemical method was studied. The film is an oxygen-rich structure with excellent color changing properties. The transmission optical density ΔOD can reach above 1 in the visible region The electrochromic behavior of Ni Ox Hy film in KOH electrolyte is determined by the proton injection or extraction.H + implanted and occupy Ni vacancies will convert a portion of Ni3 + into Ni2 +, and the decrease of Ni3 + will lead to the enhancement of optical transparency , Because the d-electron level of Ni is split into the t2g and eg levels in the NiO6 octahedral field.The injection of H + causes the t2g level of Ni3 + to be electron-filled and becomes Ni2 +, resulting in optical On the other hand, the extraction of H + causes t2 g level holes, that is, the formation of Ni3 +, leading to light absorption