论文部分内容阅读
用双离子束镀膜方法在W基底表面制备不同厚度的Cr薄膜.用冷场扫描电镜能谱分析仪对镀膜样品成分深度分布进行分析,使用重离子加速器对镀膜样品进行高能、低束流的氢或氘辐照,用扫描电镜对样品表面形貌变化进行分析,运用粒子注入射程模拟软件SRIM对氢粒子在Cr/W双层块体中的射程进行模拟分析.实验结果表明,运用双离子束镀膜法能够在膜与基底的接触面区域制得Cr/W混合过渡层;在高能、低束流的氢或氘辐照下,Cr/W混合过渡层易于使气体滞留而起泡,双离子束制备的Cr膜层不易聚集氢或氘气体成泡.
The Cr films with different thickness were prepared on the surface of W substrate by dual-ion beam deposition method.The depth distribution of the coating samples was analyzed by cold field scanning electron microscope (EDS), and the coated samples were analyzed by heavy ion accelerator Deuterium irradiation was observed by scanning electron microscopy (SEM). The range of hydrogen particles in the Cr / W bilayer block was simulated by particle injection range simulation software SRIM.The experimental results show that the dual ion beam coating The Cr / W mixed transition layer can be prepared in the contact area between the film and the substrate. In the high energy, low beam hydrogen or deuterium irradiation, the Cr / W mixed transition layer is easy to make the gas stagnate and blister. The double ion beam Preparation of the Cr film is not easy to gather hydrogen or deuterium gas bubbles.